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Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-On-Glass Films With Different Methods of Nondestructive Instrumentation
Published
Author(s)
E Kondoh, M R. Baklanov, Eric K. Lin, D Gidley, A Nakashima
Abstract
Porosity and pore size of siloxane-based porous spin-on-glass (SOG) thin films are comparatively studied with different non-destructive methods and also with reference nitrogen porosimetry. The pore size and its spread are found to increase with increasing porosity, or with decreasing dielectric constant.
Proceedings Title
Ultrasonic Electronics, Proceedings of the Symposium on | | | Japanese Journal of Applied Physics
Kondoh, E.
, Baklanov, M.
, Lin, E.
, Gidley, D.
and Nakashima, A.
(2001),
Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-On-Glass Films With Different Methods of Nondestructive Instrumentation, Ultrasonic Electronics, Proceedings of the Symposium on | | | Japanese Journal of Applied Physics, Undefined
(Accessed October 11, 2025)