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Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography
Published
Author(s)
John H. Burnett, Zachary H. Levine, E L. And shirley
Citation
Semiconductor Fabtech 15<sup>th</sup> Edition
Publisher Info
ICG Publishing , London,
Pub Type
Books
Citation
Burnett, J.
, Levine, Z.
and And, E.
(2002),
Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography, ICG Publishing , London,
(Accessed October 8, 2025)