High index optical materials for 193 nm immersion lithography

Simon G. Kaplan; J H. Burnett; Eric L. Shirley; D Horowitz; W Clauss; A Grenville; C Van peski

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PUBLICATIONS

High index optical materials for 193 nm immersion lithography

Published

January 1, 2006

Author(s)

Simon G. Kaplan, J H. Burnett, Eric L. Shirley, D Horowitz, W Clauss, A Grenville, C Van peski

Citation

SPIE

Volume

6154

Pub Type

Journals

Citation

Kaplan, S. , Burnett, J. , Shirley, E. , Horowitz, D. , Clauss, W. , Grenville, A. and Van, C. (2006), High index optical materials for 193 nm immersion lithography, SPIE (Accessed June 19, 2026)

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Created January 1, 2006, Updated February 17, 2017

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