Kaplan, S.
, Burnett, J.
, Shirley, E.
, Horowitz, D.
, Clauss, W.
, Grenville, A.
and Van, C.
(2006),
High index optical materials for 193 nm immersion lithography, SPIE
(Accessed May 4, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
High index optical materials for 193 nm immersion lithography
Published
Author(s)
, J H. Burnett, , D Horowitz, W Clauss, A Grenville, C Van peski
Citation
SPIE
Volume
6154
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 2006, Updated February 17, 2017