NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Measurement of Lithographic Overlay by Light Scattering Ellipsometry, ed. by Z.H. Gu and A.A. Maradudin

Published

Author(s)

Thomas A. Germer
Proceedings Title
Surface Scattering and Diffraction for Advanced Metrology II
Conference Dates
July 9-11, 2002
Conference Location
Seattle, WA
Conference Title
Proc. SPIE 4780
Pub Type
Conferences

Citation

Germer, T. (2002), Measurement of Lithographic Overlay by Light Scattering Ellipsometry, ed. by Z.H. Gu and A.A. Maradudin, Surface Scattering and Diffraction for Advanced Metrology II , Seattle, WA (Accessed November 3, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 1, 2002, Updated February 17, 2017
Was this page helpful?