Stricklett, K.
, Kassoff, J.
, Olthoff, J.
and Van Brunt, R.
(1995),
Appearance Potentials of Ions Produced by Electron-Impact Induced Dissociative Ionization of SF<sub>6</sub> and Related Compounds, Proc., Intl. Symp. on Gaseous Dielectrics, Knoxville, TN, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=27876 (Accessed April 27, 2026)
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Appearance Potentials of Ions Produced by Electron-Impact Induced Dissociative Ionization of SF6 and Related Compounds
Published
Author(s)
, J. M. Kassoff, ,
Abstract
Methods are described, which are based on the use of a commercial mass spectrometer, for determination of ionization and fragment ion appearance potentials by electron impact. These methods are applied to the principal sulfur-bearing compounds produced by decomposition of SF6 by electrical discharges. The compounds investigated include: SF4, SO2, SOF2, SO2F2, SOF4, SF5Cl, S2F10, S2OF10, and S2O2F10, as well as SF6. Experimental conditions are recommended for improved sensitivity to trace levels of these decomposition by-products in SF6.Proceedings Title
Proc., Intl. Symp. on Gaseous Dielectrics
Conference Dates
April 24-28, 1994
Conference Location
Knoxville, TN
Pub Type
Conferences
Download Paper
Keywords
appearance potential, decomposition by-products, electron impact ionization, ionization potential, sulfur hexafluoride
Citation
Issues
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Created February 28, 1995, Updated October 12, 2021