Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry

Published

July 2, 2004

Author(s)

R C. Hedden, Hae-Jeong Lee, Christopher L. Soles, Barry J. Bauer

Abstract

A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. The technique is applied to characterize a spin-on organosilicate low dielectric constant (low-k) material with a random pore structure. Porosimetry experiments are conducted using a contrast match solvent (a mixture of toluene-d8 and toluene-h8) having the same neutron scattering length density as that of the nanoporous film matrix. The film is exposed to contrast match toluene vapor in a carrier gas (air), and pores fill with liquid by capillary condensation. The partial pressure of the solvent vapor is increased stepwise from 0 (pure air) to P0 (saturated solvent vapor), and then decreased stepwise to 0 (pure air). As the solvent partial pressure increases, pores fill with liquid solvent progressively from smallest to largest.

Citation

Langmuir

Volume

20

Pub Type

Journals

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Keywords

film density, neutron scattering porosimetry, porosity, porous low-k dielectric material, small-angle neutron scattering, x-ray porosimetry

Citation

Hedden, R. , Lee, H. , Soles, C. and Bauer, B. (2004), Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry, Langmuir, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852279 (Accessed October 11, 2025)