Kondoh, E.
, Baklanov, M.
, Lin, E.
, Gidley, D.
and Nakashima, A.
(2001),
Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-On-Glass Films Using Different Methods of Nondestructive Instrumentation, Japanese Journal of Applied Physics Part 2: Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851851
(Accessed October 9, 2025)
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Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-On-Glass Films Using Different Methods of Nondestructive Instrumentation
Published
Author(s)
E Kondoh, M R. Baklanov, , D Gidley, A Nakashima
Abstract
Pore sizes of hydrogen-methyl-siloxane-based porous spin-on-glass (SOG) thin films are comparatively studied with different non-destructive instrumental methods and also with reference to sorption porosimetry. The pore size and its spread are found to increase with increasing porosity, or with decreasing dielectric constant.Citation
Japanese Journal of Applied Physics Part 2: Letters
Volume
40
Issue
No. 4A
Pub Type
Journals
Download Paper
Keywords
ellipsometry, low-dielectric-constant thin films, neutron scattering, pore size distribution, positron annihilation
Citation
Issues
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Created March 31, 2001, Updated October 12, 2021