Green, D.
, Looney, J.
and Rubloff, G.
(2000),
Application of CW-CRDS to Monitor and Control Chemical Vapor Deposition, 2000 IEEE/LEOS Summer Topical Meeting : Optical Sensing in Semiconductor Manufacturing, Aventura, FL (Accessed May 11, 2026)
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Application of CW-CRDS to Monitor and Control Chemical Vapor Deposition
Published
Author(s)
, , G W. Rubloff
Abstract
Continuous wave excitation cavity ring-down spectroscopy (CW-CRDS) is being evaluated for real time chemical sensing of volatile CVD byproducts (e.g. HF, H2O) and as a quantitative and robust metrology tool for advanced process control methodologies.Proceedings Title
2000 IEEE/LEOS Summer Topical Meeting : Optical Sensing in Semiconductor Manufacturing
Conference Dates
July 24-26, 2000
Conference Location
Aventura, FL
Pub Type
Conferences
Keywords
cavity ring down, chemical vapor deposition, diode laser, hydrogen fluoride, metrology, process control, semiconductor
Citation
Issues
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Created July 1, 2000, Updated February 19, 2017