A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).
Proceedings Title: OSA Digest Series
Conference Dates: June 13-16, 2010
Conference Location: Jackson Hole, WY
Conference Title: Optical Fabrication and Testing 2010
Pub Type: Conferences
CGH, RIE, EDGE, EFFECT