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PUBLICATIONS

Potential Energy Sputtering of EUVL Materials

Published

Author(s)

Joshua M. Pomeroy, L P. Ratliff, John D. Gillaspy, Sasa Bajt
Citation
SPIE
Volume
PM149
Pub Type
Journals

Keywords

electron beam ion trap (EBIT), euv light sources, euv lithography, highly charged ions, scanning tunneling microscopy, surface analysis, xenon

Citation

Pomeroy, J. , Ratliff, L. , Gillaspy, J. and Bajt, S. (2006), Potential Energy Sputtering of EUVL Materials, SPIE (Accessed October 11, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created February 23, 2006, Updated February 17, 2017
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