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PUBLICATIONS

Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions

Published

Author(s)

John S. Villarrubia, Nicholas W. Ritchie, J R. Lowney
Proceedings Title
Proceedings of SPIE, Volume 6518
Volume
6518
Conference Dates
February 26-March 1, 2007
Conference Location
San Jose, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography XXI
Pub Type
Conferences

Download Paper

Local Download
Modeling and computational material science and Nanometrology

Citation

Villarrubia, J. , Ritchie, N. and Lowney, J. (2007), Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions, Proceedings of SPIE, Volume 6518, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=913838 (Accessed October 10, 2025)

Issues

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Created March 1, 2007, Updated February 19, 2017
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