Fabrication of 200 nm Period Hard X-Ray Phase Gratings

Published

June 11, 2014

Author(s)

Houxun Miao, Andrew A. Gomella, Nicholas Chedid, Lei Chen, Han Wen

Abstract

Far field x-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the x-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard x-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact x-ray sources having low spatial coherence, as demonstrated by x-ray diffraction experiments.

Citation

Nano Letters

Volume

14

Issue

6

Pub Type

Journals

Download Paper

https://doi.org/10.1021/nl5009713

Local Download

Keywords

Hard x-ray phase grating, grating Bonse-Hart interferometer, x-ray Mach-Zehnder interferometer, x-ray phase contrast imaging, nano-imprint lithography, cryogenic reactive ion etch, atomic layer deposition, electroplating.

Citation

Miao, H. , Gomella, A. , Chedid, N. , Chen, L. and Wen, H. (2014), Fabrication of 200 nm Period Hard X-Ray Phase Gratings, Nano Letters, [online], https://doi.org/10.1021/nl5009713, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=915830 (Accessed October 8, 2025)