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NanoFab Tool: SUSS HMX Square 9 Automatic Mask Develop Cr-etch
Credit:
NIST
The SUSS HMX square system is a single photomask, automated wet chemical processing tool. It first uses a TMAH-based developer to dissolve lithographically exposed photoresist patterns. Following development, the system utilizes a ceric ammonium nitrate-based etchant to etch the chrome layer on the photomask.
Specifications/Capabilities
- Stepper photomask processing.
- Contact lithography photomask processing.
Usage Information
Supported Sample Sizes
- Photomask Processing Only. No wafer processing.
- Mask sizes supported:
- 5-inch square, 0.090-inch-thick quartz.
- 6-inch square, 0.120-inch-thick quartz.
- 6-inch square, 0.250-inch-thick quartz.
- Small pieces supported: No.
Typical Applications
- Photomask processing:
- Photomask development.
- Photomask chrome etch.
Created December 15, 2025