Embracing Uncertainty: Modeling Uncertainty in EPMA - Part I

Published

May 21, 2020

Author(s)

Nicholas Ritchie

Abstract

This is the first in a series of articles which present a new framework for computing the uncertainty in electron excited X-ray microanalysis measurements. This article will discuss the framework and apply it to a handful of simple but useful sub-components of the larger problem. Subsequent articles will handle more complex aspects of the measurement model. The result will be a framework in which sophisticated and practical models of the uncertainty budget for real- world measurements. It will include many long overlooked contributions like surface roughness and coating thickness. The result provides more than just error bars for our measurements. It also provides a framework for measurement optimization and, ultimately, the development of an expert system to guide both the novice and expert to design more e ective measurement protocols.

Citation

Microscopy and Microanalysis

Pub Type

Journals

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Keywords

EPMA, WDS, EDS, EDX, Uncertainty, GUM, BIPM, X-ray

Citation

Ritchie, N. (2020), Embracing Uncertainty: Modeling Uncertainty in EPMA - Part I, Microscopy and Microanalysis, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928649 (Accessed October 9, 2025)