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Journal of Research (NIST JRES)

Hydrogen-Deuterium Exchange Mass Spectrometry (HDX-MS) Centroid Data Measured between 3.6 °C and 25.4 °C for the Fab Fragment of NISTmAb

Author(s)
Jeffrey W. Hudgens, Elyssia S. Gallagher, Ioannis L. Karageorgos, Kyle W. Anderson, Richard Y. Huang, Guodong Chen, George M. Bou-Assaf, Alfonso Espada, Michael J. Chalmers, Edu Harguindey, Hui-Min Zhang, Benjamin T. Walters, Jennifer Zhang, John Venable, Caitlin Steckler, In Hee Park, Ansgar Brock, Xiaojun Lu, Ratnesh Pandey, Arun Chandramohan, Ganesh Srinivasan Anand, Sasidhar N. Nirudodhi, Justin Sperry, Jason C. Rouse, James A. Carroll, Kasper D. Rand, Ulrike Leurs, David D. Weis, Mohammed A. Al-Naqshabandi, Daniel Deredge, Patrick Wintrode, Malvina Papanastasiou, John D. Lambris, Sheng Li, Sarah Urata
The spreadsheet file reported herein provides centroid data, descriptive of deuterium uptake, for the Fab Fragment of NISTmAb (PDB: 5K8A) reference material, as

Design, Manufacturing, and Inspection Data for a Three-Component Assembly

Author(s)
Thomas D. Hedberg, Michael E. Sharp, Toby M. Maw, Mostafizur M. Rahman, Swati Jadhav, James J. Whicker, Allison Barnard Feeney, Moneer M. Helu
To better understand and address the challenges faced in linking all stages of a manufacturing and design process, an investigative fabrication process was

X-ray Metrology for the Semiconductor Industry Tutorial

Author(s)
Daniel F. Sunday, Wen-Li Wu, Scott Barton, Regis J. Kline
The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation

Gain Calibration of Current-to-Voltage Converters

Author(s)
Thomas C. Larason, Carl C. Miller
Current-to-voltage converters are used in many photometric and radiometric applications. The calibration of current- to-voltage converters at a few input

Baseline Tailor

Author(s)
Joshua Lubell
Baseline Tailor is an innovative web application for users of the National Institute of Standards and Technology (NIST) Cybersecurity Framework and Special