Image depicts how polymer molecules self-assemble to line up vertically, a hard-to-achieve nanoscale “posture” fostered by the rough substrate on which the thin film forms.
The initially flat substrate of silicon (gray) was controllably roughened by adding a layer of nanoparticles (orange). A layer of self-organizing polymer material (block copolymer) was then added atop.
Getting block copolymers in thin-film coatings to stand perpendicular to the template is a desired patterning capability important for nanotech applications.
The image was generated with 3-D rendering software that merged different nanoscale height-scans, obtained using an atomic force microscope.