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Chemical Process and Nuclear Measurements Group

The group performs state-of-the art chemical and physical measurements to provide reference data, develop standards and models, and advance chemical measurement science and the fundamental understanding of chemical systems.

Research activities include elucidation of reaction mechanisms and time-dependent phenomena, such as the measurement of rate constants, transport properties, and the transformation of complex chemical systems by investigating composition, electronic and structural properties as it relates to chemical and physical function.   The group compiles, critically evaluates, and disseminates reference methods, data, and Standard Reference Materials.  Additionally, the group maintains facilities and expertise in nuclear methods for elemental analysis in collaboration with the NIST Center for Neutron Research and external partners.  The research focuses on areas of national and industrial needs such as those related to energy, manufacturing, security, and the environment. Group members are engaged with international standards development organizations and other National Metrology Institutes to establish comparability of measurement capabilities.

Atomic layer deposition (ALD)
Atomic layer deposition (ALD) reactor with time resolved optical diagnostics

TEM Images
Transmission electron microscopy (TEM) images of aerosol reference material candidates

Etch Chamber
Inductively-coupled Plasma-Etch Chamber

The video below is a 10 Minute Introduction to Neutron Depth Profiling

News and Updates

Small Wonder

NIST helps semiconductor manufacturers—who are under continual pressure to make smaller, faster computer chips—reduce

Projects and Programs

Plasma Process Metrology

Our multifaceted program provides numerous outputs to assist our customers. First, we develop and evaluate a variety of measurement techniques that provide

Tools and Instruments

Contacts

Group Leader

Office Manager