Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

NanoFab Tool: Denton Vacuum Infinity 22 Electron Beam Evaporator

Photograph of the Denton Vacuum Infinity 22 evaporator.

The Denton Vacuum Infinity 22 electron beam evaporator vapor deposits thin films and is capable of loading up to six source materials for deposition. The evaporator is equipped with an ion gun using oxygen gas to densify dielectric films during deposition. A rotating planetary substrate holder ensures deposition uniformity on substrates ranging from 150 mm diameter wafers down to small pieces.


  • Cryogenically pumped chamber has a base vacuum of 1.0 x 10-5 Pa (8 x 10-8 Torr).
  • Rotating planetary substrate holder provides uniform film deposition.
  • Rotating planetary substrate holder capacity: 4 whole wafers or piece carriers.
  • Six source electron gun evaporation.
  • Fully automatic or manual operation.
  • Multilayer deposition.
  • Ion assisted deposition of dielectrics with oxygen.
  • List of available electron gun evaporation sources: Ag, Al, Al-1%Si, Al2O3, Au, AuPd (60/40), Co, CoFe, Cr, Cu, Fe, Ga2O3, Ge, Graphite, HfO2, MgF2, Mo, Ni, NiCr, Pd, Pt, Py, Si, SiO2, Ta, Ti, TiO2, V, W, Y, ZnO

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 150 mm (6 in).
  • Wafer diameters: 50 mm (2 in), 75 mm (3 in), 100 mm (4 in), and 150 mm (6 in).
  • Small pieces supported: Yes.

Typical Applications

  • Metallization for electrical contacts.
  • Dielectrics.
  • Dry etch masks.
  • Magnetic materials.
Created June 4, 2014, Updated February 24, 2023