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NanoFab Tool: Denton Vacuum Infinity 22 Electron Beam Evaporator

Photograph of the Denton Vacuum Infinity 22 evaporator.

The Denton Vacuum Infinity 22 electron beam evaporator vapor deposits thin films and is capable of loading up to six source materials for deposition. The evaporator is equipped with an ion gun to clean substrates prior to deposition and to densify dielectric films during deposition. A rotating planetary substrate holder ensures deposition uniformity on substrates ranging from 150 mm diameter wafers down to small pieces.

Specifications/Capabilities

  • Cryogenically pumped chamber has a base vacuum of 1.0 x 10-5 Pa (8 x 10-8 Torr).
  • Rotating planetary substrate holder provides uniform film deposition.
  • Rotating planetary substrate holder capacity: 4 whole wafers or piece carriers.
  • Six source electron gun evaporation.
  • Fully automatic or manual operation.
  • Multilayer deposition.
  • Ion gun with selectable gases:
    • Argon for oxide removal prior to deposition.
    • Oxygen for ion assisted deposition of dielectrics.
  • Over 25 deposition sources provided by the NanoFab including most common metals and dielectrics; contact our engineers for more information.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 150 mm (6 in).
  • Wafer diameters: 50 mm (2 in), 75 mm (3 in), 100 mm (4 in), and 150 mm (6 in).
  • Small pieces supported: Yes.

Typical Applications

  • Metallization for electrical contacts.
  • Dielectrics.
  • Dry etch masks.
  • Lift-off processes.
  • Magnetic materials.
Created June 4, 2014, Updated April 5, 2019