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Gaithersburg

Photo of NIST team conducting wireless communication tests in Denver

Call Forwarding: New NIST Procedure Could Speed Cell Phone Testing

March 2, 2010

By accurately re-creating the jumbled wireless signal environment of a city business district in a special indoor test facility, researchers at the National...

Mouse Work: New Insights on a Fundamental DNA Repair Mechanism

March 2, 2010

Adding a new link to our understanding of the complex chain of chemistry that keeps living cells alive, a team of researchers from the University of Vermont...

Computer Forensic Reference Data Sets

For more information, visit: http://www.cfreds.nist.gov/ NIST is developing Computer Forensic Reference Data Sets (CFReDS) for digital evidence. These reference

Computer Forensics Tool Testing (CFTT)

For more information, visit: http://www.cftt.nist.gov/ There is a critical need in the law enforcement community to ensure the reliability of computer forensic

SDO/EVE/ESP Calibration

NASA launched the Solar Dynamics Observatory ( SDO) satellite on 11 Feb 2010 on a mission to study the sun. The EUV Variability Experiment ( EVE) on SDO

NIST Radiation Thermometry Short Course

Mon, Oct 15 - Fri, Oct 19 2012

The NIST Radiation Short Course is offered every 2 years and covers the fundamentals of radiometric physics and

Calibrations: Neutron Source Strength

The neutron source calibration facility operated by NIST is a world-class calibration laboratory providing neutron source calibration services for radioisotopic

NIST Launches New Competition for Research Facility Construction Grants

February 25, 2010

The Commerce Department's National Institute of Standards and Technology (NIST) today announced a new competition for grants for the construction of new or...

IMS Visualization

The fundamental measures (IMS) project is producing vast amounts of data. This project will visualize the three classes of computer models of networks - micro

NIST Grants Awards for Recovery Act Fellowship Programs

February 19, 2010

GAITHERSBURG, Md.—The U.S. Commerce Department's National Institute of Standards and Technology (NIST) announced today that it is awarding a total of $19.5...

NIST Spectroradiometry Short Course

Tue, Apr 7 - Fri, Apr 10 2020

NIST is closely monitoring guidance from Federal, State, and local health authorities on the outbreak of COVID-19. To

Bilateral Comparison of Spectral Responsivity in the Vacuum-Ultraviolet

To compare the calibration capabilities for the spectral responsivity in the vacuum-ultraviolet spectral region between 135 nm and 250 nm, PTB and NIST agreed

High Resolution Atomic Spectroscopy

Accurate measurements of atomic wavelengths, energy levels, oscillator strengths and isotope and hyperfine structure using diffraction grating spectrographs

Electron Beam Ion Trap (EBIT) Facility

The NIST EBIT Facility is used to investigate the science and applications of highly charged ions.

NIST Photometry Short Course

Tue, Sep 24 - Fri, Sep 27 2019

NIST is closely monitoring guidance from Federal, State, and local health authorities on the outbreak of COVID-19. To

Atomic Spectroscopy Data Center

Critical compilations of atomic energy levels, transition wavelengths, and transition probabilities. Online databases.

Meeting of the CEOS's Working Group on Calibration and Validation

Tue, Mar 2 - Fri, Mar 5 2010

NIST is hosting the 31st plenary meeting of the CEOS's Working Group of Calibration and Validation (WGCV) at the Bolger

Slap Fingerprint Segmentation Evaluation II (slapsegII)

SlapsegII has been superseded by SlapsegIII Begin: April 7, 2009 SlapSegII is now being performed as an ongoing evaluation...

MEP to Support New Building-Efficiency Research Center

February 16, 2010

The National Institute of Standards and Technology's Hollings Manufacturing Extension Partnership (MEP) will be supporting the creation of a regional research...

International Biometrics Conference to Meet at NIST March 2-4

February 16, 2010

The National Institute of Standards and Technology (NIST) is co-sponsoring an international conference on biometric performance March 2-4 at NIST headquarters...

Photograph depicting IC manufacturing showing glowing squares on a round wafer, with a yellow triangular warning indicator labeled UV.

Advanced IC Interconnects - Process Metrology and Models

The objective for Advanced IC Interconnects is to provide measurement standards and advanced measurement methods supporting metrology needs of the semiconductor

Robert Rudnitsky Elected Chair of OECD Working Party on Nanotechnology

February 22, 2010

Robert Rudnitsky has been elected chair of the Organisation for Economic Cooperation and Development (OECD) Working Party on Nanotechnology (WPN). The election...

TEDCO NIST NIH Bio-Imaging Technologies Showcase (9/2009)

October 6, 2009

A TECHNOLOGY TRANSFER AND FEDERAL MARKETPLACE EVENT TEDCO, NIST and NIH Present Bio-imaging Technologies For Commercial Adoption On Tuesday, October 6, 2009...

Beamline 4: EUV and UV Detector Calibrations

Detector calibrations are a crucial component of the United States industry's extreme ultraviolet (EUV) calibrations needs. Both EUV source manufacturers and

Baldrige Process Integrity

Multiple safeguards ensure the integrity of the Baldrige Program and the Malcolm Baldrige National Quality Award and ensure fairness and...

NIST Issues Expanded Draft of Smart Grid Cyber Security Strategy For Public Review and Comment

February 3, 2010

The Commerce Department's National Institute of Standards and Technology (NIST) issued today the second draft of its Smart Grid Cyber Security Strategy and...

Baldrige by Sector: Manufacturing

Can a manufacturer facing global competition, increased pressure on costs, and the need to show quarterly profits benefit from the Baldrige...

New to Baldrige

New to Baldrige? We're Here to Help. "When we began applying the Baldrige principles to our business, little did I realize how different...

Thermodynamics of Enzyme-catalyzed Reactions

To develop the thermodynamic data and methodology required for effective bioprocess engineering.

James Alexander Liddle Becomes Contributing Editor of InterNano

February 16, 2010

J. Alexander Liddle has accepted an invitation from InterNano to be a contributing editor for expert reviews in the topical category of Advanced Processes and...

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