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This tool removes the particulate residues resulting after wafer polishing using the CMP. These particles are typically a few tens of nanometers in size. The
The CMP removes material both chemically, by use of a corrosive colloidal slurry, and mechanically, by way of a wafer carrier under controlled pressure rotating
The two Sandvik oxidation furnaces, equipped with silicon carbide tubes, support oxidation processing in the NanoFab. The oxidation furnaces support thermal wet
This Bulletin provides an update on forensic science standards that are moving through the development process at Standards Developing Organizations (SDOs), and
The Sandvik low pressure chemical vapor deposition (LPCVD) polysilicon furnaces supports amorphous and polycrystalline silicon deposition in the NanoFab. The
The two Sandvik low pressure chemical vapor deposition (LPCVD) silicon nitride furnaces support stoichiometric and low stress silicon nitride deposition on
The Sandvik low pressure chemical vapor deposition (LPCVD) of silicon oxide furnace supports low temperature oxide (LTO) on substrates ranging from small chips
The two Sandvik anneal furnaces, equipped with silicon carbide tubes, support anneal processing in the NanoFab. The anneal furnaces allow nitrogen, argon and
NATIONAL HARBOR, Md.—Noting that this year's winners “are held in highest esteem in your communities and, now, in our nation," U.S. Secretary of Commerce Wilbur
The objective of Activities in Extended Videos (ActEV) evaluation series is to accelerate development of robust, multi-camera, automatic activity detection
Thank you, Chairwoman Stevens, Chairman Lamb, Ranking Member Baird, Ranking Member Weber, and members of the Subcommittees. I am Mike Molnar, Director of the...
GAITHERSBURG, Md.—The U.S. Department of Commerce’s National Institute of Standards and Technology (NIST) is seeking help from residents of Sevier County