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On-Wafer Metrology of a Transmission Line Integrated Terahertz Source

Published

Author(s)

Kassiopeia A. Smith, Bryan T. Bosworth, Nicholas R. Jungwirth, Jerome G. Cheron, Nathan D. Orloff, Christian J. Long, Dylan F. Williams, Richard A. Chamberlin, Franklyn J. Quinlan, Tara M. Fortier, Ari D. Feldman

Abstract

A combination of on-wafer metrology and high-frequency network analysis was implemented to measure the response of transmission-line integrated Er-GaAs and InGaAs photomixers up to 1 THz to support the telecommunication and electronics industry.
Conference Dates
May 10-15, 2020
Conference Location
San Jose, CA
Conference Title
CLEO: Laser Science to Photonic Applications

Citation

Smith, K. , Bosworth, B. , Jungwirth, N. , Cheron, J. , Orloff, N. , Long, C. , Williams, D. , Chamberlin, R. , Quinlan, F. , Fortier, T. and Feldman, A. (2020), On-Wafer Metrology of a Transmission Line Integrated Terahertz Source, CLEO: Laser Science to Photonic Applications, San Jose, CA, [online], https://doi.org/10.1364/CLEO_AT.2020.JTu2G.23 (Accessed July 27, 2021)
Created May 9, 2020, Updated October 15, 2020