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A versatile bilayer resist for laser lithography at 405 nm on glass substrates

Published

Author(s)

Quandou (. Wang, Ulf Griesmann

Abstract

We describe a simple bilayer photoresist that is particularly well suited for laser lithography at an exposure wavelength of 405 nm on glass substrates, which is often used for the fabrication of binary diffractive optics and computer generated holograms. The resist consists of a bottom layer based on poly-dimethyl glutarimide (PMGI), that is used as an anti-reflection coating between a glass substrate and a positive or negative photoresist. The optical properties of the PMGI layer at 405 nm result in excellent suppression of reflections into the photoresist and good process latitude.
Citation
Optical Engineering

Keywords

photoresist, computer generated hologram, maskless photo-lithography, zone plate array lithography

Citation

Wang, Q. and Griesmann, U. (2013), A versatile bilayer resist for laser lithography at 405 nm on glass substrates, Optical Engineering, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=913532 (Accessed March 3, 2024)
Created October 23, 2013, Updated February 19, 2017