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A versatile bilayer resist for laser lithography at 405 nm on glass substrates



Quandou (. Wang, Ulf Griesmann


We describe a simple bilayer photoresist that is particularly well suited for laser lithography at an exposure wavelength of 405 nm on glass substrates, which is often used for the fabrication of binary diffractive optics and computer generated holograms. The resist consists of a bottom layer based on poly-dimethyl glutarimide (PMGI), that is used as an anti-reflection coating between a glass substrate and a positive or negative photoresist. The optical properties of the PMGI layer at 405 nm result in excellent suppression of reflections into the photoresist and good process latitude.
Optical Engineering


photoresist, computer generated hologram, maskless photo-lithography, zone plate array lithography


Wang, Q. and Griesmann, U. (2013), A versatile bilayer resist for laser lithography at 405 nm on glass substrates, Optical Engineering, [online], (Accessed July 23, 2024)


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Created October 23, 2013, Updated February 19, 2017