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USAXS-Analysis of Electron-Beam Physical Vapour Deposited Thermal Barrier Coatings and Applications of Void Structure Modelling to Determine the Influence of Process Parameters on the Thermal Conductivity

Published

Author(s)

A Flores Renteria, B Saruhan, J Ilavsky, Andrew J. Allen
Citation
Surface and Coatings Technology
Volume
201

Citation

Flores Renteria, A. , Saruhan, B. , Ilavsky, J. and Allen, A. (2007), USAXS-Analysis of Electron-Beam Physical Vapour Deposited Thermal Barrier Coatings and Applications of Void Structure Modelling to Determine the Influence of Process Parameters on the Thermal Conductivity, Surface and Coatings Technology, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854216 (Accessed March 3, 2024)
Created August 31, 2007, Updated October 12, 2021