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USAXS-Analysis of Electron-Beam Physical Vapour Deposited Thermal Barrier Coatings and Applications of Void Structure Modelling to Determine the Influence of Process Parameters on the Thermal Conductivity
Published
Author(s)
A Flores Renteria, B Saruhan, J Ilavsky, Andrew J. Allen
Flores Renteria, A.
, Saruhan, B.
, Ilavsky, J.
and Allen, A.
(2007),
USAXS-Analysis of Electron-Beam Physical Vapour Deposited Thermal Barrier Coatings and Applications of Void Structure Modelling to Determine the Influence of Process Parameters on the Thermal Conductivity, Surface and Coatings Technology, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854216
(Accessed October 9, 2025)