NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Underpotential Deposition of Tl on (111)-Textured Au: In Situ Stress and Nanogravimetric Measurements
Published
Author(s)
Jae W. Shin, Ugo Bertocci, Gery R. Stafford
Abstract
The surface stress associated with the underpotential deposition (UPD) of thallium (Tl) on (111)-textured Au is examined, using the wafer curvature method, in acidic perchlorate supporting electrolyte. The process was also examined by independent nanogravimetric measurements using an electrochemical quartz crystal nanobalance (EQNB). We observe a sweep rate dependence for both the individual voltammetric waves and stress response which we attribute to kinetically controlled surface alloying which occurs only at low coverage. Similar behavior has been reported for Pb UPD on (111)-textured Au but the kinetics for Tl are considerably slower and are very sensitive to the defect density of the Au(111) surface. At high coverage, a hexagonal close packed (hcp) Tl monolayer is formed while the surface alloy is removed. The stress hump that is coincident with the last voltammetric wave appears to be caused by the formation and removal of the surface alloy. This is confirmed by long-term potentiostatic pulsing experiments.
Shin, J.
, Bertocci, U.
and Stafford, G.
(2010),
Underpotential Deposition of Tl on (111)-Textured Au: In Situ Stress and Nanogravimetric Measurements, Journal of Physical Chemistry C, [online], https://doi.org/10.1021/jp1034486
(Accessed October 10, 2025)