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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics



H. R. Huff, Curt A. Richter, M. L. Green, G. Lucovsky, T. Hattori
Proceedings Title
Proc., Mater. Res. Soc. Symp.
Conference Location
Pittsburgh, PA, USA


Huff, H. , Richter, C. , Green, M. , Lucovsky, G. and Hattori, T. (1999), Ultrathin SiO<sub>2</sub> and High-K Materials for ULSI Gate Dielectrics, Proc., Mater. Res. Soc. Symp. , Pittsburgh, PA, USA (Accessed June 15, 2024)


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Created August 31, 1999, Updated October 12, 2021