Huff, H.
, Richter, C.
, Green, M.
, Lucovsky, G.
and Hattori, T.
(1999),
Ultrathin SiO<sub>2</sub> and High-K Materials for ULSI Gate Dielectrics, Proc., Mater. Res. Soc. Symp. , Pittsburgh, PA, USA
(Accessed December 9, 2024)
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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics
Published
Author(s)
H. R. Huff, , M. L. Green, G. Lucovsky, T. Hattori
Proceedings Title
Proc., Mater. Res. Soc. Symp.
Conference Location
Pittsburgh, PA, USA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created August 31, 1999, Updated October 12, 2021