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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics

Published

Author(s)

H. R. Huff, Curt A. Richter, M. L. Green, G. Lucovsky, T. Hattori
Proceedings Title
Proc., Mater. Res. Soc. Symp.
Conference Location
Pittsburgh, PA, USA

Citation

Huff, H. , Richter, C. , Green, M. , Lucovsky, G. and Hattori, T. (1999), Ultrathin SiO<sub>2</sub> and High-K Materials for ULSI Gate Dielectrics, Proc., Mater. Res. Soc. Symp. , Pittsburgh, PA, USA (Accessed June 15, 2024)

Issues

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Created August 31, 1999, Updated October 12, 2021