Chaparala, P.
, Suehle, J.
, Messick, C.
and Roush, M.
(1996),
Time-Dependent Dielectric Breakdown of Intrinsic SiO<sub>2</sub> Films Under Dynamic Stress, 1995 IEEE International Integrated Reliability Workshop Final Report, Lake Tahoe, CA, USA
(Accessed May 11, 2025)
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Time-Dependent Dielectric Breakdown of Intrinsic SiO2 Films Under Dynamic Stress
Published
Author(s)
P Chaparala, , C. Messick, M. Roush
Proceedings Title
1995 IEEE International Integrated Reliability Workshop Final Report
Conference Dates
October 22-25, 1995
Conference Location
Lake Tahoe, CA, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1996, Updated October 12, 2021