Jarrett, D.
, Payagala, S.
, Kraft, M.
and Yu, K.
(2016),
Third Generation of Adapted Wheatstone Bridge for High Resistance Measurements at NIST, CPEM 2016 Conference Digest, Ottawa, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920066
(Accessed April 24, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Third Generation of Adapted Wheatstone Bridge for High Resistance Measurements at NIST
Published
Author(s)
, Shamith Payagala, , Kwang Min Yu
Abstract
A third generation of adapted Wheatstone bridge is being developed at NIST to improve high resistance measurements and scaling from 1 TΩ to 10 PΩ. Improvements to extend range and reduce uncertainties include automated calibration of the voltage sources, modified bridge balancing algorithm, low-noise shielded cables, and software migration to a modern programming environment. Initial measurements agree well within the expanded uncertainties (k = 2) of the second generation NIST adapted Wheatstone bridge.Proceedings Title
CPEM 2016 Conference Digest
Conference Dates
July 10-15, 2016
Conference Location
Ottawa, CA
Conference Title
Conference on Precision Electromagnetic Measurements (CPEM)2016
Pub Type
Conferences
Download Paper
Keywords
adapted Wheatstone bridge, calibration, high resistance, standard resistor, voltage source
Citation
Created July 10, 2016, Updated April 4, 2022