Windover, D.
, Vartanian, V.
, Kelly, T.
, Larson, T.
and Gil, D.
(2011),
Thickness and Composition Reference Standards for Semiconductor Metrology, SEMATECH Technology Transfer #11035149A-TR, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=909798
(Accessed November 28, 2025)
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Thickness and Composition Reference Standards for Semiconductor Metrology
Published
Author(s)
, Victor H. Vartanian, Tom Kelly, Tom Larson, David L. Gil
Abstract
This report from the MET16 project describes tests of X-ray reflectometry (XRR), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atom probe tomography (APT) for thickness and compositional reference metrology.Citation
SEMATECH Technology Transfer #11035149A-TR
Pub Type
Others
Download Paper
Keywords
Measuring Instruments, Spectroscopy, Standard Artifacts, Standard Reference Material, Thin Film Thickness, X-ray Diffraction, X-ray Reflectometry
Citation
Issues
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Created July 22, 2011, Updated September 29, 2025