Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Telepresence:  A New Paradigm for Industrial and Scientific Collaboration



Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec


A portion of the mission of the National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. industry.  The successful development of a Collaboratory for Telepresence Microscopy (TPM) provides an important new tool to promote technology transfer in the areas of measurement technology.  NIST and Texas Instruments,  under the auspices of the National Automated Manufacturing Testbed (NAMT) and in collaboration with the University of Illinois (UIC) and Argonne National Laboratory (ANL) have developed a collaboratory testbed to demonstrate the value of TPM within organizations having a large distributed manufacturing facility such as Texas Instruments (TI) and between scientific research organizations such as NIST, ANL, and UIC.  Large distributed manufacturing sites such as TI need rapid response when problems threaten to disrupt multi-million dollar production facilities.  This is particularly important when expertise needed to solve the problem or instrumentation is not locally present.  The resulting delays are inevitable and often costly.  Telepresence minimizes these delays.  Once a sample has been received by a research facility, collaborators from multiple remotely located sites can rapidly access the collaboratory from their respective locations and collaborate in real-time to solve the problem using only their desktop computers and connections to the Internet. This presentation demonstrates the power afforded by this technology.
Proceedings Title
Proceedings of SPIE
Conference Dates
March 15, 1999
Conference Location
Santa Clara, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography XIII, Bhanwar Singh, Editor


analytical electron microscopy, collaboratory, Internet, metrology, scanning electron microscope, telepresence, transmission electron microscope


Postek, M. , Bennett, M. and Zaluzec, N. (1999), Telepresence:  A New Paradigm for Industrial and Scientific Collaboration, Proceedings of SPIE, Santa Clara, CA (Accessed July 15, 2024)


If you have any questions about this publication or are having problems accessing it, please contact

Created June 1, 1999, Updated February 19, 2017