Spatial Uniformity in Chamber-Cleaning Plasmas Measured Using Planar Laser-Induced Fluorescence

Published

January 1, 1998

Author(s)

Kristen L. Steffens, Mark A. Sobolewski

Abstract

Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF₂ density as an indicatior of chemical uniformity in 92% CF ₄square root of O₂ and 50% C₂F₆ square root of O₂ chamber cleaning plasmas. Measurements were also made of broadband optical emission and of discharge current and voltage. All measurements were made in the Gaseous Electronics Conference (GEC)reference cell, a capacitively-coupled, parallel-plate platform designed to facilitate comparison of results among laboratories. The PLIF and emission results were found to correlate with discharge current and voltage measurements. Together, these optical and electrical measurements provide insight into the optimization of chamber-cleaning processes and areactors and suggest new methods of monitoring plasma uniformity.

Conference Dates

January 1, 1998

Conference Title

Characterization and Metrology for ULSI Technology Conference

Pub Type

Conferences

Keywords

chamber-cleaning, Planar Laser-Induced Fluorescence (PLIF), plasma diagnostics, plasmas

Citation

, K. and Sobolewski, M. (1998), Spatial Uniformity in Chamber-Cleaning Plasmas Measured Using Planar Laser-Induced Fluorescence, Characterization and Metrology for ULSI Technology Conference (Accessed October 21, 2025)