Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Spatial Uniformity in Chamber-Cleaning Plasmas Measured Using Planar Laser-Induced Fluorescence

Published

Author(s)

Kristen L. Steffens, Mark A. Sobolewski

Abstract

Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF2 density as an indicatior of chemical uniformity in 92% CF 4square root of O2 and 50% C2F6 square root of O2 chamber cleaning plasmas. Measurements were also made of broadband optical emission and of discharge current and voltage. All measurements were made in the Gaseous Electronics Conference (GEC)reference cell, a capacitively-coupled, parallel-plate platform designed to facilitate comparison of results among laboratories. The PLIF and emission results were found to correlate with discharge current and voltage measurements. Together, these optical and electrical measurements provide insight into the optimization of chamber-cleaning processes and areactors and suggest new methods of monitoring plasma uniformity.
Conference Dates
January 1, 1998
Conference Title
Characterization and Metrology for ULSI Technology Conference

Keywords

chamber-cleaning, Planar Laser-Induced Fluorescence (PLIF), plasma diagnostics, plasmas

Citation

, K. and Sobolewski, M. (1998), Spatial Uniformity in Chamber-Cleaning Plasmas Measured Using Planar Laser-Induced Fluorescence, Characterization and Metrology for ULSI Technology Conference (Accessed June 12, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1998, Updated February 17, 2017