Maslar, J.
, Wang, C.
and Oakley, D.
(2000),
In Situ Raman Spectroscopic Characterization of Compound Semiconductor Free Carrier Concentration, Technical Digest of IEEE/LEOS 2000 Summer Topics Meetings
(Accessed April 23, 2024)
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In Situ Raman Spectroscopic Characterization of Compound Semiconductor Free Carrier Concentration
Published
Author(s)
, C Wang, D C. Oakley
Abstract
Free carrier concentrations in compound semiconductors were determined using Raman spectroscopy. Spectra of selected films were recorded in situ in a chemical vapor deposition reactor operating from room temperature to growth temperature.Proceedings Title
Technical Digest of IEEE/LEOS 2000 Summer Topics Meetings
Volume
31-32
Conference Dates
July 24-28, 2000
Conference Title
Lasers and Electro-optics Society (Institute of Electrical and Electronics Engineers).
Pub Type
Conferences
Keywords
chemical vapor deposition, compound semiconductors, raman spectroscopy
Citation
Created July 1, 2000, Updated February 17, 2017