Belzer, B.
and Blackburn, D.
(1997),
Semiconductor measurement technology ::the results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.SP.400-99
(Accessed September 12, 2024)
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Semiconductor measurement technology ::the results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon
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- NIST SP 400-99
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NIST SP 400-99
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Created January 1, 1997, Updated May 20, 2023