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PUBLICATIONS

Selected Area Electron Beam Induced Deposition of Pt and W for Electron Back Scattered Diffraction Backgrounds

Published

Author(s)

William Osborn, Mark McLean, Brian Bush

Abstract

Applying High Resolution Electron Backscatter Diffraction (HR-EBSD) to materials without regions amenable to acquiring backgrounds for static flat fielding (background subtraction) can cause analysis problems. To address this difficulty, the efficacy of Electron Beam Induced Deposition (EBID) material as a source for an amorphous background signal is assessed and found to be practical. Using EBID material for EBSD backgrounds allows single crystal and large grained samples to be analyzed using HR-EBSD for strain and small angle rotation measurement.
Citation
Microscopy and Microanalysis
Pub Type
Journals

Download Paper

https://doi.org/10.1017/S1431927618016173
Local Download

Keywords

EBSD, EBID, HR-EBSD, Background, Band Contrast
Nanomechanics, Nanoelectronics, Metals and Materials

Citation

Osborn, W. , McLean, M. and Bush, B. (2019), Selected Area Electron Beam Induced Deposition of Pt and W for Electron Back Scattered Diffraction Backgrounds, Microscopy and Microanalysis, [online], https://doi.org/10.1017/S1431927618016173, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=926224 (Accessed October 13, 2025)

Issues

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Created February 1, 2019, Updated September 29, 2025
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