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Displaying 1 - 6 of 6

Effect of Alternating Ar and SF6/C4F8 Gas Flow in Si Nano-Structure Plasma Etching

August 1, 2011
Author(s)
Lei Chen, Vincent K. Luciani, Houxun H. Miao
Si is very reactive to normal plasma etchants such as fluorine based chemicals and the reactions are inherently isotropic. To fabricate small and/or high aspect ratio nanoscale structures in Si, anisotropic profile is necessary. SF6 combined with C4F8 has

Nanofabrication Techniques for Controlled Drug Released Devices

January 1, 2011
Author(s)
Lei Chen, Gerard Henein, Vincent K. Luciani
New drugs and delivery systems have undergone a rapid development in recent years for treating cancer, HIV aids, diseased organs, damaged nerves to relieve pain, prevent disease and restore health to human beings. The application of nanofabrication in