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A Phosphine Sub Atmospheric Delivery System (SADS) applied to Low Pressure Chemical Vapor Deposition (LPCVD) of in situ doped Polysilicon.

Published

Author(s)

Vincent K. Luciani, William D. Young Jr, Lei Chen, Jerry L. Bowser
Proceedings Title
University Government Industry Micro/Nano Symposium
Conference Dates
July 9-10, 2012
Conference Location
Berkeley, CA, US

Citation

Luciani, V. , Young Jr, W. , Chen, L. and Bowser, J. (2012), A Phosphine Sub Atmospheric Delivery System (SADS) applied to Low Pressure Chemical Vapor Deposition (LPCVD) of in situ doped Polysilicon., University Government Industry Micro/Nano Symposium, Berkeley, CA, US, [online], https://doi.org/10.1109/UGIM.2012.6247086, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=911015 (Accessed May 18, 2024)

Issues

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Created July 22, 2012, Updated October 12, 2021