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Displaying 2076 - 2100 of 2177

Enhanced Machinability of Silicon Carbide via Microstructural Design

January 1, 1995
Author(s)
Nitin P. Padture, Christopher J. Evans, Hockin D. Xu, Brian R. Lawn
The machinability of a heterogeneous silicon carbide with weak interphase boundaries, elongated grains, and high internal stresses is evaluated relative to a homogeneous control material with a well-bonded, equiaxed, and unstressed grain structure

Error Compensation for CMM Touch Trigger Probes

January 1, 1995
Author(s)
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, Christoph J. Witzgall, M Levenson, et al
We present the analysis of a simple mechanical model of a common type of kinematic seat touch trigger probe widely used on modem coordinate measuring machines (CMMs). The model provides a quantitative description of the pre-travel variation or probe lobing

Fabrication of Optics by Diamond Turning

January 1, 1995
Author(s)
Richard L. Rhorer, Christopher J. Evans
The use of special machine tools with single-crystal diamond-cutting tools to produce metal optics is called diamond turning. The manufacture of optical surfaces by diamond turning is relatively new compared to the traditional optical-polishing methods. In

Measurement and Analysis of Forces in Grinding of Silicon Nitride

January 1, 1995
Author(s)
S Jahanmir, T W. Hwang, Eric P. Whitenton, S Job, Christopher J. Evans
Using an instrumented surface grinder, the two components of grinding forces (normal and tangential) were measured for different types of silicon nitride ceramics. The influences of grinding parameters, such as down feed and table speed, and grinding

Measurement of Patterned Film Linewidth for Interconnect Characterization

January 1, 1995
Author(s)
L Linholm, Robert Allen, Michael W. Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A. Kramar
The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have shown differences in linewidth as great as 90 nm for selected conductive films. These differences

Measuring Long Gage Blocks with the NIST Line Scale Interferometer

January 1, 1995
Author(s)
John S. Beers
An improved method for temporarily converting long gage blocks into line scales is described. The new process employs fused silica rather than previously used steel conversion gage blocks. Conversion blocks are pairs of small (13 mm) gage blocks with

Performance Evaluations

January 1, 1995
Author(s)
Steven D. Phillips
The subject of coordinate measuring machine (CMM) evaluation is a broad an multifaceted one. The theme of this chapter is the evaluation of CMM measurement uncertainty which is central to the concept of traceability. This chapter elucidates the sources of

Pitch Diameter Measurement of Threaded Gages Using a CMM

January 1, 1995
Author(s)
Ralph C. Veale, Edgar G. Erber, Bruce R. Borchardt
The reference datum for a screw thread is the pitch diameter cylinder. Although a defined method within the United states for pitch diameter measurement exists, it does not follow worldwide procedures, and the complexity and uncertainties associated with

Progress in Tip Modeling

January 1, 1995
Author(s)
John S. Villarrubia
Progress since the last Industrial Applications of Scanned Probe Microscopy workshop in the estimation of tip geometries for scanned probe microscopes is discussed. A new method which does not require calibration of the tip characterizers has been

Scattering by a Dielectric Wedge: Oblique Incidence

January 1, 1995
Author(s)
Egon Marx
The scattering of a plane monochromatic wave by an infinite dielectric wedge is discussed for arbitrary direction of incidence and polarization. Two sets of coupled integral equations for an unknown surface function are derived. The behavior of the fields

User's Guide for the ATS Version 2.0

January 1, 1995
Author(s)
David Rosenfeld
The Algorithm Testing System (ATS) is a software system which supports the Algorithm Testing & Evaluation Program: for Coordinate Measuring Systems (ATEP-CMS). ATEP-CMS is a NIST special test service for evaluating the performance of CMS geometric fitting

Working and Check Standards for NIST Surface and Microform Measurements

January 1, 1995
Author(s)
Jun-Feng Song, Theodore V. Vorburger
Different working standards and check standards are used in the NIST surface and microform measurement laboratory for calibrating instruments, establishing measurement traceability and control measurement uncertainty. The basic requirements for these

Accuracy in Integrated Circuit Dimensional Measurements

December 1, 1994
Author(s)
James E. Potzick
The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The
Displaying 2076 - 2100 of 2177
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