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Displaying 54476 - 54500 of 74203

Photomask Metrology in the Era of Neolithography

February 1, 1997
Author(s)
James E. Potzick
The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing importance of subresolution mask characteristics, can render traditional mask metrology

Programmer

February 1, 1997
Author(s)
David W. Flater
This report documents the interfaces and functions of the 1996 demo version of the Executor. The Executor is the shop controller for the National Advanced Manufacturing Testbed (NAMT) Framework demo, a prototype distributed manufacturing system that is

A Differential Wavelength Meter for Laser Tuning

January 1, 1997
Author(s)
Lowell P. Howard, Jack A. Stone Jr.
A simple interferometer for matching the wavelengths of tunable lasers is described. Our interferometer uses the angular dispersion of a diffraction grating at the Littrow angle to produce a tilted wavefront with respect to a reference mirror in an
Displaying 54476 - 54500 of 74203
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