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NIST Authors in Bold

Displaying 45651 - 45675 of 74141

Critical Dimension Metrology in the Scanning Electron Microscope

June 29, 2001
Author(s)
Michael T. Postek, Andras Vladar
Metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 130, 100 nanometer and even smaller linewidths and high aspect ratio structures, the scanning electron

A Reference Tristimulus Colorimeter

June 25, 2001
Author(s)
George P. Eppeldauer
The accuracy of tristimulus colorimeters can be increased by using detector standards instead of traditional lamp standards for calibration. After high accuracy absolute spectral response determination of the color channels, spectral and amplitude

Security - Revenue Generator and Mission Enabler

June 21, 2001
Author(s)
G Stoneburner
We need to facilitate a change in user perception of security from a hindrance to an essential revenue generator and mission enabler. The Common Criteria protection profile (PP) and security target (ST) constructs can be used to help achieve this need. Yet

Workshop on Fire Testing Measurement Needs: Proceedings

June 19, 2001
Author(s)
William L. Grosshandler
This report describes the proceedings of a workshop held on June 18 and 19, 2001, at NIST in Gaithersburg to identify where science and technology can better prepare fire testing laboratories and their customers to meet these challenges. Topics that were

Interpretation of Resonant Photoemission Spectra of Solid Actinide Systems

June 15, 2001
Author(s)
S Molodtsov, S Halilov, M Richter, A Zangwill, C Laubschat
It is shown that angle-resolved valence-band photoemission (PE) spectra of epitaxial close-packed films of U metal may correctly be described within a one-step model of PE based on a band description of the U 5f states. It is found that a cross-section

High Temperature Characteristics of 5kV, 20 A 4H-SiC PiN Rectifiers

June 7, 2001
Author(s)
Ranbir Singh, Allen R. Hefner Jr., David W. Berning, M. Palmer
This paper reports in detail, the design, a manufactuable fabrication process, and high temperature characteristics of a 4H-SiC rectifier with a 5 kV, 20 A rating. A highly doped p-type epitaxial Anode layer and junction termination extension (JTE) were

Interferometric Figure Metrology; Enabling In-House Traceability

June 6, 2001
Author(s)
Christopher J. Evans, Angela Davies, Tony L. Schmitz, R E. Parks
The basic goal of the Advanced Optics Metrology program at NIST''s Manufacturing Engineering Laboratory is to help industry ensure that their measurement results of optical figure and wavefront are traceable. This paper underscores the importance of

First Workshop on Wireless Sensing

June 4, 2001
Author(s)
Kang B. Lee, James D. Gilsinn, Richard D. Schneeman, Hui-Min Huang
The First Wireless Sensing Workshop was held on June 4, 2001, at the Sensors Expo/Conference at the Rosemont Convention Center in Chicago, IL. The National Institute of Standards and Technology (NIST), SENSORS magazine, Sensors Conference, and Institute of

The Cultural Context of Web Genres: Content vs. Style

June 4, 2001
Author(s)
A Badre, Sharon J. Laskowski
The question we raise here is whether what is culturally established for a given genre in the brick and mortar world applies equally on the World Wide Web. Can we effectively use the styles of one genre to design the site of another genre? Are we wedded to

100 Years of Optical Science and Metrology at NIST

June 1, 2001
Author(s)
William R. Ott
The National Bureau of Standards (NBS) was formed by Congress 100 years ago. The early Bureau was a small organization, founded at the beginning of the age of electricity to promote industrial productivity, commerce, technological progress, and the quality

100 Years of Photometry and Radiometry Harnessing Light

June 1, 2001
Author(s)
Jonathan E. Hardis
Measurement of light is an old subject, though the past 100 years have seen significant advances. 100 years ago, photometry the art and science of measuring light as it is preceived by people had the greatest technological importance. Even today, SI (the

A Combined Process/Resource-oriented Approach to Shopfloor Simulation

June 1, 2001
Author(s)
Hyunbo Cho, Albert W. Jones, P Y. Jang
Manufacturing simulation tools are used frequently to analyze proposed planning, scheduling, and control decisions that attempt to optimize some performance measure(s) for the shop. These shops exhibit a dynamic and complicated evolution caused by the

A Framework for Managing Faults and Attacks in All-Optical Transport Networks

June 1, 2001
Author(s)
J K. Patel, S U. Kim, David H. Su, M Subramaniam, H A. Choi
ult and attack survivability in all-optical transport networks (AOTNs) require new approaches because of unique transmission characteristics. Specifically, fiber non-linearities and network transparency to transmitted signal types may make the network
Displaying 45651 - 45675 of 74141
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