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Displaying 426 - 450 of 1314

SIM.EM-S5 Voltage, Current and Resistance Comparison

June 1, 2012
Author(s)
Harold Sanchez, Lucas Di Lillo, Gregory Kyriazis, Rodrigo Ramos, Randolph Elmquist, Nien F. Zhang
This paper reports the results of the second Interamerican Metrology System (SIM) comparison on calibration of digital multimeters, performed for strengthening the interaction among National Metrology Institutes (NMIs) and for establishing the degree of

A thickness-shear MEMS resonator employing electromechanical transduction through a coplanar waveguide

May 21, 2012
Author(s)
Ward L. Johnson, Thomas M. Wallis, Pavel Kabos, Eduard Rocas, Juan C. Collado Gomez, Li-Anne Liew, Albert Davydov, Alivia Plankis, Paul R. Heyliger
The design, modeling, fabrication, and characterization of a vibrationally trapped thickness-shear MEMS resonator is presented. This device is intended to avoid various limitations of flexural MEMS resonators, including nonlinearity, clamping losses

NIST Framework and Roadmap for Smart Grid Interoperability Standards, Release 2.0

February 16, 2012
Author(s)
George W. Arnold, Gerald FitzPatrick, David A. Wollman, Thomas L. Nelson, Paul A. Boynton, Galen H. Koepke, Allen R. Hefner Jr., Cuong Nguyen, Jeffrey A. Mazer, Dean Prochaska, Marianne M. Swanson, Tanya L. Brewer, Victoria Yan Pillitteri, David H. Su, Nada T. Golmie, Eric D. Simmon, Allan C. Eustis, David Holmberg, Steven T. Bushby, Michael D. Janezic, Ajitkumar Jillavenkatesa
The Energy Independence and Security Act (EISA) of 2007 requires that NIST develop a framework of standards for the Smart Grid. This document is the second release of the framework first published in January, 2010. It covers the activities and outputs of

A statistical study of de-embedding applied to eye diagram analysis

February 1, 2012
Author(s)
Paul D. Hale, Jeffrey A. Jargon, Chih-Ming Wang, Brett Grossman, Matthew Claudius, Jose Torres, Andrew M. Dienstfrey, Dylan F. Williams
We describe a stable method for calibrating digital waveforms and eye diagrams using the measurement system response function and its regularized inverse. The function describing the system response includes the response of the oscilloscope and any

Radio Frequency and Analog/Mixed-Signal Technologies

January 20, 2012
Author(s)
Herbert S. Bennett, John J. Pekarik
This 2011 roadmap for radio frequency and analog/mixed-signal (RF and AMS) technologies presents the challenges, technology requirements, and potential solutions for the basic technology elements (transistors and passive devices). RF and AMS technologies

Origin of Electrical Signals for Plasma Etching Endpoint Detection

November 18, 2011
Author(s)
Mark A. Sobolewski
Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not known. They may be caused by changes in the gas-phase densities of etch products and reactants or by changes in

In Situ Gas Phase Diagnostics for Titanium Nitride Atomic Layer Deposition

October 14, 2011
Author(s)
James E. Maslar, William A. Kimes, Brent A. Sperling
This report describes the performance of a technique for the simultaneous, rapid measurement of major gas phase species present during titanium nitride thermal atomic layer deposition involving tetrakis(dimethylamido) titanium (TDMAT) and ammonia. In this

Radiation, Multimode Propagation, and Substrate Modes in W-Band CPW Calibrations

October 10, 2011
Author(s)
Dylan F. Williams, Franz-Joseph Schmuckle, Ralf Dorner, G.N. Phung, Wolfgang Heinrich, Uwe Arz
We investigate the degradation of the accuracy of coplanar waveguide calibration standards at higher frequencies due to multi-mode propagation, substrate modes, and radiation. Based on a typical calibration substrate, we investigate these effects and their

In Situ Gas Phase Measurements During Metal Alkylamide Atomic Layer Deposition

July 12, 2011
Author(s)
James E. Maslar, William A. Kimes, Brent A. Sperling
Metal alkylamide compounds, such as tetrakis(ethylmethylamido) hafnium (TEMAH), represent a technologically important class of metalorganic precursors for the deposition of metal oxides and metal nitrides via atomic layer deposition (ALD) or chemical vapor
Displaying 426 - 450 of 1314
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