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Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology

Published

Author(s)

Richard M. Silver

Abstract

Recent developments in optical microscopy promise to advance optical metrology and imaging to unprecedented levels through theoretical and experimental development of a new measurement technique called "scatterfield optical imaging". ". Current metrology requirements are demanding higher throughput measurements with nanometer sensitivity to enable tighter process control as well as closed-loop integrated process control. This new technique makes possible high throughput measurements of nanometer-sized features using low cost optical methods with the potential for substantial impact on manufacturing productivity and process control as well as providing the measurement basis for new calibration standards well beyond the state-of-the-art.
Citation
Laser Focus World
Volume
45
Issue
1

Keywords

optical microscopy, optical metrology and imaging, "scatterfield optical imaging", nanometer sensitivity, high throughput measurements, low cost optical methods

Citation

Silver, R. (2009), Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology, Laser Focus World (Accessed May 27, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2009, Updated February 19, 2017