Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology

Published

January 1, 2009

Author(s)

Richard M. Silver

Abstract

Recent developments in optical microscopy promise to advance optical metrology and imaging to unprecedented levels through theoretical and experimental development of a new measurement technique called "scatterfield optical imaging". ". Current metrology requirements are demanding higher throughput measurements with nanometer sensitivity to enable tighter process control as well as closed-loop integrated process control. This new technique makes possible high throughput measurements of nanometer-sized features using low cost optical methods with the potential for substantial impact on manufacturing productivity and process control as well as providing the measurement basis for new calibration standards well beyond the state-of-the-art.

Citation

Laser Focus World

Volume

45

Issue

1

Pub Type

Journals

Keywords

optical microscopy, optical metrology and imaging, "scatterfield optical imaging", nanometer sensitivity, high throughput measurements, low cost optical methods

Citation

Silver, R. (2009), Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology, Laser Focus World (Accessed November 28, 2023)