Postek, M.
(1994),
Scanning Electron Microscope Metrology, Proceedings of SPIE, Monterey, CA
(Accessed June 6, 2025)
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Scanning Electron Microscope Metrology
Published
Author(s)
Abstract
During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various forms of scanning probe microscopies are major microscopical techniques used for submicrometer metrology. New techniques applied to scanning electron microscopy have improved some of the limitations of this technique and time will permit even further improvements. This presentation will review the current state of scanning electron microscopes (SEM) metrology in light of many of these recent improvements.Proceedings Title
Proceedings of SPIE
Volume
CR52
Conference Dates
September 28-29, 1993
Conference Location
Monterey, CA
Conference Title
Critical Reviews of Optical Science and Technology
Pub Type
Conferences
Citation
Issues
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Created January 1, 1994, Updated February 19, 2017