Kopanski, J.
, Marchiando, J.
and Lowney, J.
(1995),
Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon, Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors, Research Triangle Park, NC, USA
(Accessed October 11, 2024)
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Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon
Published
Author(s)
, ,
Proceedings Title
Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors
Conference Dates
March 20-22, 1995
Conference Location
Research Triangle Park, NC, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1995, Updated October 12, 2021