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Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon

Published

Author(s)

Joseph Kopanski, Jay F. Marchiando, J R. Lowney
Proceedings Title
Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors
Conference Dates
March 20-22, 1995
Conference Location
Research Triangle Park, NC, USA

Citation

Kopanski, J. , Marchiando, J. and Lowney, J. (1995), Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon, Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors, Research Triangle Park, NC, USA (Accessed May 26, 2024)

Issues

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Created December 30, 1995, Updated October 12, 2021