Gornakov, V.
, Nikitenko, V.
, Egelhoff, W.
, McMichael, R.
, Shapiro, A.
and Shull, R.
(2003),
Ru Spacer Thickness Dependences of the Domain Nucleation and Growth in Co/Ru/Co Synthetic Antiferromagnet, Journal of Magnetism and Magnetic Materials
(Accessed April 26, 2024)
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Ru Spacer Thickness Dependences of the Domain Nucleation and Growth in Co/Ru/Co Synthetic Antiferromagnet
Published
Author(s)
, , , , ,
Abstract
The relative orientation of Co magnetization vectors in a Co/Ru/Co/Ta structure vary gradually from parallel to antiparallel orientation as a function of Ru thickness varying from 0 nm to 1.0 nm. At intermediate average Ru thicknesses from 0.2 nm to 0.35 nm, the sandwich ground states were characterized by non-collinear magnetization orientations. Real-time magneto-optical indicator film images reveal either 180 domain walls, magnetization reversal was observed to proceed incrementally with each cycle of an AC field.Citation
Journal of Magnetism and Magnetic Materials
Volume
258
Issue
Sp.
Pub Type
Journals
Keywords
domain walls, magnetic imaging, magnetic pinholes, synthetic antiferromagnet
Citation
Created March 1, 2003, Updated February 17, 2017