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Ru Spacer Thickness Dependences of the Domain Nucleation and Growth in Co/Ru/Co Synthetic Antiferromagnet

Published

Author(s)

V S. Gornakov, Valerian I. Nikitenko, William F. Egelhoff Jr., Robert D. McMichael, Alexander J. Shapiro, Robert D. Shull

Abstract

The relative orientation of Co magnetization vectors in a Co/Ru/Co/Ta structure vary gradually from parallel to antiparallel orientation as a function of Ru thickness varying from 0 nm to 1.0 nm. At intermediate average Ru thicknesses from 0.2 nm to 0.35 nm, the sandwich ground states were characterized by non-collinear magnetization orientations. Real-time magneto-optical indicator film images reveal either 180 domain walls, magnetization reversal was observed to proceed incrementally with each cycle of an AC field.
Citation
Journal of Magnetism and Magnetic Materials
Volume
258
Issue
Sp.

Keywords

domain walls, magnetic imaging, magnetic pinholes, synthetic antiferromagnet

Citation

Gornakov, V. , Nikitenko, V. , Egelhoff, W. , McMichael, R. , Shapiro, A. and Shull, R. (2003), Ru Spacer Thickness Dependences of the Domain Nucleation and Growth in Co/Ru/Co Synthetic Antiferromagnet, Journal of Magnetism and Magnetic Materials (Accessed February 29, 2024)
Created March 1, 2003, Updated February 17, 2017