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Robust Optical Design of Angled Multilayer Dielectric Mirrors Optimized for Rubidium Vapor Cell Return Reflection

Published

Author(s)

M A. Perez, John Kitching, A Shkel

Abstract

This paper reports on the design and implementation of thin film multilayer dielectric reflectors on the sidewalls of micromachined reflector cells. Due to shadowing within the cavity, significant variations in the thicknesses of the thin films will be encountered when fabricated using PECVD. Such variations in deposition thickness cells may limit optical performance. An optimized design procedure is described to maximize the performance of the reflector under these variations. In addition, an optical design based on the superposition of multiple shifted quarter wave bragg reflectors is used to form a reflector with extended optical bandwidth. This extended reflectance range maintains high reflection at the D1 absorption wavelength of 87Rb over greater then 70% uniformity variation for use in miniature rubidium vapor cells for atomic MEMS applications.
Proceedings Title
Proceedings of the Hilton Head Workshop 2008: A Solid-State Sensors, Actuators, and Microsystems Workshop
Conference Dates
June 1-5, 2008
Conference Location
Hilton Head, SC, US
Conference Title
Proc. 2008 Hilton Head Sensors and Actuators Conference

Keywords

micromachining, alkali vapor cell, atomic clock, magnetometer, gyroscope

Citation

Perez, M. , Kitching, J. and Shkel, A. (2008), Robust Optical Design of Angled Multilayer Dielectric Mirrors Optimized for Rubidium Vapor Cell Return Reflection, Proceedings of the Hilton Head Workshop 2008: A Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head, SC, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=842429 (Accessed June 24, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created July 31, 2008, Updated October 12, 2021