Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes

Published

July 29, 2014

Author(s)

Ravikiran Attota, Ronald G. Dixson

Abstract

We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using the through-focus scanning optical microscopy (TSOM) method. These initial results show that TSOM-determined cross-sectional (3-D) shape differences of 30 nm to 40 nm wide lines agree well with critical-dimension atomic force microscope measurements. The TSOM method showed a linewidth uncertainty of 1.22 nm (k=2). Complex optical simulations are not needed for analysis using the TSOM method, making the process simple, economical, fast and ideally suited for high volume nanomanufacturing process monitoring.

Citation

Applied Physics Letters

Volume

105

Pub Type

Journals

Download Paper

DOI Link

Keywords

TSOM, nanometrology, three-dimensional metrology, through-focus scanning, nanomanufacturing, nanotechnology, MEMS, NEMS, defect analysis, process control

Citation

Attota, R. and Dixson, R. (2014), Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes, Applied Physics Letters, [online], https://doi.org/10.1063/1.4891676 (Accessed October 16, 2025)