Ding, Y.
, Germer, T.
, Douglas, J.
, Okerberg, B.
, Karim, A.
and Soles, C.
(2007),
Relaxation behavior of polymer structures fabricated by nanoimprint lithography, ACS Nano
(Accessed May 6, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Relaxation behavior of polymer structures fabricated by nanoimprint lithography
Published
Author(s)
Y R. Ding, , J F. Douglas, B Okerberg, A E. Karim, C L. Soles
Citation
ACS Nano
Volume
1
Issue
2
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2006, Updated October 12, 2021