Gupta, R.
, Burnett, J.
, Griesmann, U.
, Dehmer, J.
and Roberts, J.
(1997),
Refractive Index of Fused Silica and Calcium Fluoride Near 193 nm, Third International Symposium on 193 nm Lithography , Okada, JA
(Accessed July 27, 2024)
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Refractive Index of Fused Silica and Calcium Fluoride Near 193 nm
Published
Author(s)
, J H. Burnett, U Griesmann, ,
Proceedings Title
Third International Symposium on 193 nm Lithography
Conference Location
Okada, JA
Conference Title
Proc. Third International Symposium on 193 nm Lithography
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 1997, Updated February 17, 2017