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Refractive Index of Fused Silica and Calcium Fluoride Near 193 nm

Published

Author(s)

R Gupta, J H. Burnett, U Griesmann, J L. Dehmer, J R. Roberts
Proceedings Title
Third International Symposium on 193 nm Lithography
Conference Location
Okada, JA
Conference Title
Proc. Third International Symposium on 193 nm Lithography

Citation

Gupta, R. , Burnett, J. , Griesmann, U. , Dehmer, J. and Roberts, J. (1997), Refractive Index of Fused Silica and Calcium Fluoride Near 193 nm, Third International Symposium on 193 nm Lithography , Okada, JA (Accessed June 22, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1997, Updated February 17, 2017