NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Rapid-Thermal Annealing for Quantum-Well Heterostructure Device Fabrication
Published
Author(s)
Daryl Myers, G. A. Vawter, G A. Jones, T. E. Zipperian, T. J. Drummond, I. J. Fritz, L. R. Dawson, T. M. Brennan, B. E. Hammons, A. K. Datye, David S. Simons, J. Comas
Citation
IEEE Transactions on Electron Devices
Volume
39
Issue
1
Pub Type
Journals
Citation
Myers, D.
, Vawter, G.
, Jones, G.
, Zipperian, T.
, Drummond, T.
, Fritz, I.
, Dawson, L.
, Brennan, T.
, Hammons, B.
, Datye, A.
, Simons, D.
and Comas, J.
(1992),
Rapid-Thermal Annealing for Quantum-Well Heterostructure Device Fabrication, IEEE Transactions on Electron Devices
(Accessed November 7, 2025)