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A Prototype Application Protocol for Ready-to-Wear Pattern Making

Published

Author(s)

Yung-Tsun Lee, Howard T. Moncarz

Abstract

A Ready-to-Wear Pattern Making Information Model is introduced for extending the emerging international Standard for the Exchange of Product Model Data (STEP) to include the exchange of apparel pattern data. This model focuses on a representation of two-dimensional (flat) patterns generated by the traditional ready-to-wear pattern making and grading method. A testing methodology of the information model is also described in this paper.
Citation
NIST Interagency/Internal Report (NISTIR) - 5115
Report Number
5115

Keywords

pattern making information model, STEP, apparel, testing methodology

Citation

Lee, Y. and Moncarz, H. (1993), A Prototype Application Protocol for Ready-to-Wear Pattern Making, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.5115, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=821275 (Accessed June 13, 2024)

Issues

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Created December 31, 1992, Updated October 12, 2021