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Progress Toward a Semiconductor Depth-Profiling Standard

Published

Author(s)

David S. Simons, P Chi, R. G. Downing, James R. Ehrstein, J. F. Knudsen
Proceedings Title
Proc., SIMS-VI, Secondary Ion Mass Spectrometry Conference
Conference Dates
September 13-18, 1987
Conference Location
Versailles, 1, FR

Citation

Simons, D. , Chi, P. , Downing, R. , Ehrstein, J. and Knudsen, J. (1988), Progress Toward a Semiconductor Depth-Profiling Standard, Proc., SIMS-VI, Secondary Ion Mass Spectrometry Conference, Versailles, 1, FR (Accessed April 23, 2024)
Created December 30, 1988, Updated October 12, 2021